发明名称 MONOMER HAVING LACTONE SKELETON, POLYMER COMPOUND AND PHOTORESIST COMPOSITION
摘要 Disclosed is a novel monomer having a lactone skeleton, which is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or water solubility after hydrolysis. The monomer having a lactone skeleton is represented by following Formula (1), wherein Ra represents a hydrogen atom, halogen atom, or substituted or unsubstituted alkyl group having 1 to 6 carbon atoms; R1 represents a group having a lactone skeleton; and Y represents a bivalent organic group having 1 to 6 carbon atoms.
申请公布号 US2010316954(A1) 申请公布日期 2010.12.16
申请号 US20090918693 申请日期 2009.01.21
申请人 KOYAMA HIROSHI;SUMIDA MARI;TANAKA HIROKI 发明人 KOYAMA HIROSHI;SUMIDA MARI;TANAKA HIROKI
分类号 G03F7/20;C07D307/20;C08F24/00;G03F7/004 主分类号 G03F7/20
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