发明名称 |
ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To form a lighting area which has a trapezoidal light intensity distribution in a prescribed direction and also has a pupil intensity distribution in a substantially uniform shape with respect to each point. <P>SOLUTION: An illumination optical system which lights up a surface (M; W) to be irradiated with light from a light source (1) includes: an optical integrator (7) having a plurality of wavefront division elements arranged in two dimensions and in parallel; and a condensing optical system (8) which condenses luminous flux passed through the wavefront division elements. A first distance along the optical axis of the illumination optical system between a first rear-side focus position of a wavefront division element associated with a first direction (X direction) in a plane (XZ plane) orthogonal to the optical axis (AX) and a front-side focus position of the condensing optical system is larger than a second distance along the optical axis between a second rear-side focus position of the wavefront division element associated with a second direction (Z direction) in the plane and a front-side focus position of the condensing optical system. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010283249(A) |
申请公布日期 |
2010.12.16 |
申请号 |
JP20090136843 |
申请日期 |
2009.06.08 |
申请人 |
NIKON CORP |
发明人 |
TANITSU OSAMU |
分类号 |
H01L21/027;G02B3/00;G02B3/06;G02B17/08 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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