MANUFACTURING METHOD OF ELECTROOPTICAL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrooptical device wherein elements such as transistors can be formed with a good yield on a substrate to be treated. SOLUTION: The manufacturing method of a liquid crystal device 11 wherein TFT elements are formed of a first face 101a of the substrate to be treated 101 includes: a process of forming a conductive film 70 covering from the first face 101a to a second face 101b; a process of forming a resist pattern 83 on an element area 82 of the first face 101a; a process of etching and removing the conductive film 70 in the area except the element area 82 by using the resist pattern 83 as a mask; and a process of forming a gate electrode by patterning the remaining conductive film 70 after removing the resist pattern 83. In the process of etching and removing the conductive film, etching is carried out in such a manner wherein the substrate to be treated 101 is supported by bringing a plurality of support members 81 into contact with an area not overlapping the element area 82 of the first face 101a. COPYRIGHT: (C)2011,JPO&INPIT