| 发明名称 |
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME |
| 摘要 |
A salt having a group represented by the formula (I): -T  (I) wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by —O— or —S— and which can have one or more substituents.
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| 申请公布号 |
US2010316951(A1) |
申请公布日期 |
2010.12.16 |
| 申请号 |
US20100797459 |
申请日期 |
2010.06.09 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ICHIKAWA KOJI;SUGIHARA MASAKO;SHIMADA MASAHIKO |
| 分类号 |
G03F7/004;C07D327/06;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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