| 摘要 |
<P>PROBLEM TO BE SOLVED: To correct distortion of an imaging pattern due to interference effect of light, generated when forming a microlens array obtained by arranging unit lenses in a matrix form at a pitch d (μm) of not less than (λ/0.365) μm and not more than (2λ/0.365) μm in the XY direction, by exposing and developing a pattern of a density distribution mask, using a light of wavelength λ (μm) on a photosensitive material layer. <P>SOLUTION: The density distribution mask for use has a form of equal density line which is represented by an XY coordinate by using the center of the unit lens as an original position is represented by a super ellipse expression X<SP>k</SP>+Y<SP>k</SP>=r<SP>k</SP>, by using a parameter k and radius r, wherein the parameter k is not less than 2.05 and not more than 2.45, and the parameter k lies within a range of 1.16+2.93(0.365d/λ)-2.14(0.365d/λ)<SP>2</SP>+0.448(0.365d/λ)<SP>3</SP>±0.5. <P>COPYRIGHT: (C)2011,JPO&INPIT |
