| 摘要 |
PROBLEM TO BE SOLVED: To improve efficiency for cleaning a periphery of a substrate in an apparatus and a method for liquid-treating the substrate and a program for liquid-treating the substrate. SOLUTION: The apparatus for liquid-treating the substrate includes: a substrate rotation means 19 for rotating the substrate 2; a periphery cleaning means 21 for cleaning the periphery of the substrate 2 with a rotating cleaning body 32; and a cleaning liquid supply means 22 for supplying cleaning liquid to the substrate 2. When cleaning the substrate 2 by the cleaning liquid using the apparatus for liquid-treating the substrate while contacting the periphery of the rotating substrate 2 with the rotating cleaning body 32, a rotation direction of the substrate 2 by the substrate rotation means 19 and a rotation direction of the cleaning body 32 by the periphery cleaning means 21 are made to be reversed so that advancing directions of the substrate 2 and the cleaning body 32 at a cleaning area where the substrate 2 and the cleaning body 32 contact with each other become the same direction, and a rotation speed ratio (substrate:cleaning body) between a rotation speed of the substrate 2 by the substrate rotation means 19 and a rotation speed of the cleaning body 32 by the periphery cleaning means 21 becomes within a range from 1:1 to 3.5:1. COPYRIGHT: (C)2011,JPO&INPIT
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