| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce variation in atmospheric pressure caused, for example, as a substrate is carried in and out. <P>SOLUTION: An exposure apparatus has a chamber (10) and exposes the substrate (30) in the chamber (10), and includes: a regulating means for regulating the atmospheric pressure in the chamber (10); and an opening/closing means (2) provided to the chamber, and opening and closing an opening part (1) through which the substrate (30) is carried in and out. The regulating means regulates an outflow amount of gas from the chamber (10) as the opening is opened and closed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
