| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which is advantageous in terms of throughput in case of, for example, an alignment measurement error. <P>SOLUTION: The exposure device which has a stage holding a substrate and moving, lights up an alignment mark formed on the substrate held on the stage to measure its position, and positions the substrate based upon the measured position to expose the substrate includes a control means for previously setting a plurality of lighting conditions for the alignment mark, and changing a first lighting condition among the plurality of lighting conditions into a second lighting condition among the plurality of lighting conditions in response to the occurrence of an alignment measurement error under the first lighting condition. <P>COPYRIGHT: (C)2011,JPO&INPIT |
