发明名称 |
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME |
摘要 |
A salt represented by the formula (a1): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents —CO—O—Xa1— or —CH2—O—Xa2— wherein Xa1 and Xa2 independently each represent a C1-C15 alkylene group and one or more —CH2— in the alkylene group can be replaced by —O— or —CO—, Y1 represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O— or —CO—, and Z+ represents an organic cation.
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申请公布号 |
US2010316952(A1) |
申请公布日期 |
2010.12.16 |
申请号 |
US20100797466 |
申请日期 |
2010.06.09 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ICHIKAWA KOJI;SUGIHARA MASAKO;SAKAMOTO HIROMU |
分类号 |
G03F7/20;C07C69/74;C07C69/753;C07C69/76;C07D307/77;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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