发明名称 ETCHING CHEMICAL LIQUID HEATING DEVICE FOR MANUFACTURING SEMICONDUCTOR
摘要 PURPOSE: An apparatus for heating etching chemical in order to manufacture semiconductors is provided to improve heat transferring efficiency by including a heating unit on the external wall of a chemical storing tank. CONSTITUTION: A support fixing part is combined with the center part on the base side of a housing(11). A heater coil supporter(20) is installed on the upper side of the support fixing part. A heater coil(23) is installed in a heater coil loading groove(21). An interval maintaining ring(30) is interposed between the housing and the heater coil supporter. A heat transferring media(M) transfers heat from the heater coil to chemical.
申请公布号 KR20100131173(A) 申请公布日期 2010.12.15
申请号 KR20090049939 申请日期 2009.06.05
申请人 FLUORO TECH CO., LTD. 发明人 LEE, TAE CHEON
分类号 H01L21/02;H01L21/302 主分类号 H01L21/02
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