| 摘要 |
<p>PURPOSE: A four-gradation photomask and a using method thereof is provided to manufacture a four-gradation photomask by reducing the number of a lithography in half by combining a film having etching resistance and a film having no-etching resistance. CONSTITUTION: A first semitransparent unit(15A) includes a first semitransparent film(17A) on the surface of a transparent substrate(16). A second semitransparent unit(15B) includes a second semitransparent film on the surface of the transparent substrate. A shielding unit(13) is formed by laminating a first semitransparent film, a shielding film, and a second semitransparent film which are successively laminated. The first semitransparent includes metal and silicon material. The second semitransparent and a shielding film includes chrome as main component.</p> |
