发明名称 ARRAY SUBSTRATE INCLUDING THIN FILM TRANSISTOR OF POLYCRYSTALLINE SILICON AND METHOD OF FABRICATING THE SAME
摘要 <p>PURPOSE: An array substrate including a thin film transistor of a polycrystalline silicon and a method of fabricating the same, using a data line, a source, and a drain electrode by crystallizing amorphous silicon semiconductor into a poly-silicon semiconductor. CONSTITUTION: A gate wiring is formed on a substrate(101). A gate electrode(108) is connected to the gate wiring. A gate insulating layer(112) is formed on the gate wiring and the gate electrode. A sub-metal layer and a metal layer are formed on the gate insulating layer. A data wire(132), a source electrode(135), and a drain electrode(138) by patterning the sub-metal layer on the metal layer.</p>
申请公布号 KR20100130523(A) 申请公布日期 2010.12.13
申请号 KR20090049260 申请日期 2009.06.03
申请人 LG DISPLAY CO., LTD. 发明人 SEO, HYUN SIK;KANG, IM KUK;BAE, JONG UK;KIM, YONG YUB
分类号 H01L29/78;H01L21/336;H01L29/786 主分类号 H01L29/78
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