发明名称 |
ARRAY SUBSTRATE INCLUDING THIN FILM TRANSISTOR OF POLYCRYSTALLINE SILICON AND METHOD OF FABRICATING THE SAME |
摘要 |
<p>PURPOSE: An array substrate including a thin film transistor of a polycrystalline silicon and a method of fabricating the same, using a data line, a source, and a drain electrode by crystallizing amorphous silicon semiconductor into a poly-silicon semiconductor. CONSTITUTION: A gate wiring is formed on a substrate(101). A gate electrode(108) is connected to the gate wiring. A gate insulating layer(112) is formed on the gate wiring and the gate electrode. A sub-metal layer and a metal layer are formed on the gate insulating layer. A data wire(132), a source electrode(135), and a drain electrode(138) by patterning the sub-metal layer on the metal layer.</p> |
申请公布号 |
KR20100130523(A) |
申请公布日期 |
2010.12.13 |
申请号 |
KR20090049260 |
申请日期 |
2009.06.03 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
SEO, HYUN SIK;KANG, IM KUK;BAE, JONG UK;KIM, YONG YUB |
分类号 |
H01L29/78;H01L21/336;H01L29/786 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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