THIN FILM DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus which is easily applied to a large-sized substrate mass production process, and improved in the manufacturing yield.

SOLUTION: The thin film deposition apparatus includes a deposition source for emitting vapor deposition substances; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction between the first and second nozzles so as to partition a space between the first and second nozzles.

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