发明名称 System and Method for Performing Ellipsometric Measurements on an Arbitrarily Large or Continuously Moving Sample
摘要 A method for calibrating an apparatus for ellipsometric measurements performed on an arbitrarily large or continuously moving sample, using a visible sample reference frame, and one or more laser sources in order to calibrate the ellipsometer for variations in the distance between the ellipsometer apparatus and the sample of interest. Included are techniques for projecting a first laser beam spot from an incident laser source onto a sample, then analyzing the position of the first laser beam spot relative to the center of the sample reference frame using human-aided measurements and confirmations and/or computer vision techniques. Then adjusting pivot points and/or apparatus-to-sample distance to achieve a first beam spot being located about the center of the sample reference frame, and concurrently intersecting the plane of the sample. Other techniques include changing the incidence and reflectance angle using a semi-circular track arc design with a stepping motor activating each goniometer arm.
申请公布号 US2010302541(A1) 申请公布日期 2010.12.02
申请号 US20090474104 申请日期 2009.05.28
申请人 GAO CHAO 发明人 GAO CHAO
分类号 G06F19/00;G01B11/14;G01J4/00 主分类号 G06F19/00
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