| 摘要 |
A semiconductor memory device includes: first and second impurity diffusion layers that form a part of a semiconductor substrate, each of the impurity diffusion layers function as one and the other of an anode and a cathode, respectively of a pn-junction diode; a recording layer connected to the second impurity diffusion layer; and a cylindrical sidewall insulation film provided on the first impurity diffusion layer. At least a part of the second diffusion layer and at least a part of the recording layer are formed in a region surrounded by a sidewall insulation film. According to the present invention, because a pillar-shaped pn-junction diode and the recording layer are formed in a self-aligned manner, the degree of integration of a semiconductor memory device can be increased. Further, because a silicon pillar is a part of the semiconductor substrate, a leakage current attributable to a crystal defect can be reduced. |
