发明名称 LIGHTING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a lighting apparatus capable of illuminating a body in an expected state. <P>SOLUTION: The lighting apparatus illuminates a first surface based upon irradiation light supplied from a light source. The lighting apparatus includes: a polarized light splitting optical element splitting the irradiation light from the light source into first irradiation light in a first polarized state and second irradiation light in a second polarized state; a first spatial optical modulator having a plurality of first reflecting elements arrayed in two dimensions and capable of reflecting the first irradiation light from the polarized light splitting optical element, respective reflecting surfaces of the plurality of first reflecting elements being arranged at positions optically conjugate to a first plane; a second spatial optical modulator having a plurality of second reflecting elements arrayed in two dimensions and capable of reflecting the second irradiation light from the polarized light splitting optical element, respective reflecting surfaces of the plurality of second reflecting elements being arranged at positions optically conjugate to the first surface; and a control unit controlling the pluralities of first reflecting elements and second reflecting elements to adjust a first illuminance distribution on the first surface irradiated with the first irradiation light and a second illuminance distribution on the first surface irradiated with the second irradiation light. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010272640(A) 申请公布日期 2010.12.02
申请号 JP20090122235 申请日期 2009.05.20
申请人 NIKON CORP 发明人 TANITSU OSAMU
分类号 H01L21/027;G02B5/04;G02B5/30;G02B19/00;G03F7/20 主分类号 H01L21/027
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