发明名称 VERTICAL WAFER BOAT
摘要 PROBLEM TO BE SOLVED: To provide a vertical wafer boat that can suppress a deformation amount of a semiconductor wafer as much as possible, can reduce stress generated at each support position of the semiconductor wafer as much as possible, and can suppress the occurrence of flawing and slippage. SOLUTION: The vertical wafer boat has a plurality of arm portions 11a, 12a, 13a, and 14a extended in directions perpendicular to axial directions of supports 11, 12, 13, and 14, respectively, and at least two projections 3a to 3d, and 4a to 4h supporting the semiconductor wafer are provided on respective upper surfaces of the plurality of arm portions, the projections on the same plane being positioned on two or more concentric circles X and Y differing in radius and at least three projections 3a to 3d, and 4a to 4h being present on the respective concentric circles. Further, the projections positioned on the two or more concentric circles are arranged in different radius directions, and the radii of the two or more concentric circles X and Y are 40 to 95% of the radius of the semiconductor wafer. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010272683(A) 申请公布日期 2010.12.02
申请号 JP20090123081 申请日期 2009.05.21
申请人 COVALENT MATERIALS CORP 发明人 TANAKA TATSUYA;SUZUKI SATOSHI;OTSUKA YUKIE
分类号 H01L21/683;H01L21/22 主分类号 H01L21/683
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