| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection apparatus for preventing erroneous detection of defects regardless of a change in an environmental temperature. SOLUTION: The defect inspection apparatus 1 includes: a stage 10 for supporting a wafer 5; an objective lens 11 disposed so that it opposes the stage 10; a lighting optical system 20 for applying illumination light to the surface of the wafer 5 supported by the stage 10 via the objective lens 11 by vertical illumination; a detection optical system 30 for receiving reflection light from the surface of the wafer 5 irradiated with illumination light via the objective lens 11, and detecting luminance information on a pupil face of the objective lens 11; and an image processing unit 45 for detecting defects in repeating patterns formed on the surface of the wafer 5, based on luminance information on the pupil face of the objective lens 11 detected by the detection optical system 30. A polarization element 15 is provided on an optical path of illumination light and reflection light between the wafer 5 and the objective lens 11 supported on the stage 10. COPYRIGHT: (C)2011,JPO&INPIT
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