| 摘要 |
PROBLEM TO BE SOLVED: To improve throughput of a semiconductor inspection apparatus using an electron beam. SOLUTION: An apparatus for inspecting a surface of a sample includes: an electron source 14,6 for applying electron beams toward the specimen; a sample stage 14,22 for holding the specimen; a detector 14,4 for detecting electrons obtaining information about the surface of the sample by an irradiation of the electron beams toward the specimen; an image processing unit 14,5 for creating an image of the surface of the sample based on the electrons detected by the detector 14,4; and a Wiener filter 14,3 for separating a secondary electron optical system including from the sample stage 14,22 to the detector 14,4 from a primary electron optical system including from the electron source 14,6 to the sample stage 14,22. Emission electrons emitted from the surface of the sample forms a crossover in the Wiener filter 14,3 while the electron beams emitted from an electron gun 14,6 forms a crossover in the Wiener filter 14,3. Each position of the crossovers of the primary electron optical system and the secondary electron optical system differs on the Wiener filter 14,3. COPYRIGHT: (C)2011,JPO&INPIT
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