| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel or substitutional structure suitable for holding, moving or deforming an imprint template structure by being used in an imprint lithography apparatus. SOLUTION: A structure suitable for being used in an imprint lithography apparatus is disclosed. The structure includes: a support structure arranged to support an imprint template structure; a first actuator structured to apply force to the imprint template structure; and a second actuator mounted to the support structure, arranged to extend between the support structure and the imprint template structure in use, structured to apply force to the imprint template structure, and having a movement range larger than that of the first actuator. COPYRIGHT: (C)2011,JPO&INPIT |
