METHOD OF FORMING ORGANIC SEMICONDUCTOR FILM TO POLYSILSESQUIOXANE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of uniformly forming an organic semiconductor film to a polysilsesquioxane thin film without incurring a deterioration in the characteristic of an organic semiconductor. SOLUTION: In the method of forming the organic semiconductor film to the polysilsesquioxane thin film, an organic semiconductor solution containing phenyl group-modified colloidal silica is applied onto the polysilsesquioxane thin film, and a coating film is dried. COPYRIGHT: (C)2011,JPO&INPIT