| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical element and an exposure apparatus that effectively suppress a non-exposure light spectrum of a light source using a carbon dioxide gas laser as excitation light and excellently maintain imaging performance of each optical element or a wafer and a stage or the like, and a device manufacturing method using them. <P>SOLUTION: An exposure-light reflecting layer (103) reflects exposure light using a carbon dioxide gas laser as excitation light and transmits the excitation light. An excitation-light reflection preventing layer (104) prevents reflection of the excitation light. The exposure-light reflecting layer and the excitation-light reflection preventing layer are laminated in this order from the light-source side on an optical path of the exposure light. <P>COPYRIGHT: (C)2011,JPO&INPIT |
