| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming apparatus capable of forming an uneven pattern on a substrate without using any template. <P>SOLUTION: The pattern forming apparatus 10 forms the uneven pattern on the surface of the substrate (FB). Then the pattern forming apparatus 10 includes a contact device 12 which brings a curable material (LR), curing according to predetermined energy, into contact with the surface of the substrate (FB), and a curing device 11 which causes the curable material (LR) to cure by applying the predetermined energy to the curable material (LR) brought into contact with the surface of the substrate (FB) on the basis of pattern information corresponding to the pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT |
