发明名称 METHOD FOR THE PREPARATION OF HIGH PURITY SILICON
摘要 <p>A method of forming high-purity elemental silicon is disclosed. The method includes the step of heating a silica gel composition, or an intermediate composition derived from a silica gel composition, wherein the silica gel composition or intermediate composition includes at least about 5% by weight carbon, and the heating temperature is above about 1550°C. The heating step results in the production of a product which includes elemental silicon. Another aspect of the invention relates to a method for making a photovoltaic cell. The method includes the step of forming a semiconductor substrate from elemental silicon prepared as described in this disclosure. Additional steps are then undertaken to fabricate the photovoltaic device.</p>
申请公布号 WO2009002635(A8) 申请公布日期 2010.12.02
申请号 WO2008US64178 申请日期 2008.05.20
申请人 GENERAL ELECTRIC COMPANY;MCNULTY, THOMAS, FRANCIS;LEMAN, JOHN, THOMAS;LEWIS, LARRY, NEIL;D'EVELYN, MARK, PHILIP;LOU, VICTOR, LIENKONG;SHUBA, ROMAN;LEWIS, KENRICK, MARTIN;MENDICINO, FRANK, DOMINIC;HEINRICH VAN DONGEREN, JOHAN 发明人 MCNULTY, THOMAS, FRANCIS;LEMAN, JOHN, THOMAS;LEWIS, LARRY, NEIL;D'EVELYN, MARK, PHILIP;LOU, VICTOR, LIENKONG;SHUBA, ROMAN;LEWIS, KENRICK, MARTIN;MENDICINO, FRANK, DOMINIC;HEINRICH VAN DONGEREN, JOHAN
分类号 C01B33/021;H01L31/02 主分类号 C01B33/021
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