发明名称 SEMICONDUCTOR SUBSTRATE, PROCESS FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND ELECTRONIC DEVICE
摘要 <p>Provided is a semiconductor substrate equipped with a first semiconductor and a second semiconductor formed over the first semiconductor, the second semiconductor having either an impurity which exhibits P-type conductivity or first-impurity atoms which exhibit N-type conductivity and further having second-impurity atoms which bring the Fermi level of the second semiconductor having the first-impurity atoms near to the Fermi level of the second semiconductor having no first-impurity atoms. In one embodiment, the majority carrier in the second semiconductor is electrons, and the second-impurity atoms lower the Fermi level of the second semiconductor which has the first-impurity atoms. The second semiconductor is a compound semiconductor of 3- and 5-Group elements, and the second-impurity atoms may be atoms of at least one element selected from a group consisting of beryllium, boron, carbon, magnesium, and zinc.</p>
申请公布号 WO2010137260(A1) 申请公布日期 2010.12.02
申请号 WO2010JP03369 申请日期 2010.05.19
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;ICHIKAWA, OSAMU 发明人 ICHIKAWA, OSAMU
分类号 H01L21/8222;H01L21/20;H01L21/331;H01L21/338;H01L21/8232;H01L21/8248;H01L27/06;H01L29/737;H01L29/778;H01L29/812 主分类号 H01L21/8222
代理机构 代理人
主权项
地址