发明名称 MASK FOR SOLIDIFICATION, METHOD FOR SOLIDIFY AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY PANEL INCLUDING THE METHOD
摘要 <p>A crystallization mask for laser illumination for converting amorphous silicon into polysilicon is provided, which includes: a plurality of transmissive areas having a plurality of first slits for adjusting energy of the laser illumination passing through the mask; and an opaque area.</p>
申请公布号 KR100997971(B1) 申请公布日期 2010.12.02
申请号 KR20030082222 申请日期 2003.11.19
申请人 发明人
分类号 G02F1/13;G02F1/1362;B23K26/06;H01L21/20;H01L21/268;H01L21/336;H01L29/786;H01L51/50;H05B33/10 主分类号 G02F1/13
代理机构 代理人
主权项
地址