| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a process for producing a resist pattern, by which a pattern having an excellent shape can be formed. <P>SOLUTION: The process for producing a resist pattern includes the following steps (A) to (D): (A) a step of forming the first resist film on a substrate using the first resist composition comprising a resin having an acid-labile group, a photoacid generator, and a crosslinking agent, exposing and developing the first resist film to obtain the first resist pattern; (B) a step of heating the first resist pattern at 190-250°C for 10-60 s; (C) a step of forming the second resist film on the substrate on which the first resist pattern has been formed using the second resist composition, exposing the second resist film; and (D) a step of developing the exposed second resist film to obtain the second resist pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT |
