发明名称 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS
摘要 A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or CF2CF3, A is a divalent hydrocarbon group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl. Recurring units containing an aromatic ring structure are present in an amount ≧60 mol % and the recurring units having formula (1) are present in an amount <5 mol %.
申请公布号 US2010304302(A1) 申请公布日期 2010.12.02
申请号 US20100789747 申请日期 2010.05.28
申请人 MASUNAGA KEIICHI;WATANABE SATOSHI;TANAKA AKINOBU;DOMON DAISUKE 发明人 MASUNAGA KEIICHI;WATANABE SATOSHI;TANAKA AKINOBU;DOMON DAISUKE
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
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