发明名称 |
METHOD OF FORMING A MICROELECTRONIC STRUCTURE COMPRISING DUAL-LAYER LIGHT-SENSITIVE DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS FOR 193-NM LITHOGRAPHY AND LAYER STACK FOR ITS FORMATION |
摘要 |
The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes. |
申请公布号 |
EP2255377(A2) |
申请公布日期 |
2010.12.01 |
申请号 |
EP20090712806 |
申请日期 |
2009.02.19 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
MEADOR, JIM;GUERRERO, DOUGLAS;MERCADO, RAMIL-MARCELO |
分类号 |
H01L21/027;G03F7/039;G03F7/09;G03F7/095;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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