发明名称 Apparatus and method of application and development
摘要 Disclosed herein is a development apparatus having a plurality of coating units and a development process unit stacked on each other in a layered direction in a process block which is connected at the rear side of the carrier block. A first transportation unit, which ascends and descends in the layered direction, is provided in the carrier block. Also, in the carrier block, the bottom of a substrate inspection unit is located above a highest position to which the first transportation unit is able to ascend in the layered direction.
申请公布号 US7841072(B2) 申请公布日期 2010.11.30
申请号 US20060384323 申请日期 2006.03.21
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUOKA NOBUAKI;HAYASHI SHINICHI;HAYASHIDA YASUSHI;HARA YOSHITAKA
分类号 B23P19/00;B05C11/00;B05C13/00;B05C13/02 主分类号 B23P19/00
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