发明名称 |
APPARATUS FOR GENERATING PLASMA |
摘要 |
PURPOSE: An apparatus for generating plasma is provided to install another plasma generation gas injection path for the secondary supply of a plasma generation gas, thereby stably generating plasma. CONSTITUTION: A cathode electrode(110) is installed in the lower part of a cathode assembly(100). An anode electrode(210) surrounds the cathode electrode. An anode assembly(200) includes the anode electrode and plasma generation gas injection paths. If a high voltage is applied to the cathode electrode, plasma is generated between the anode electrode and the cathode electrode. The plasma generation gas injection paths inject a plasma generation gas to a plasma generation space. At least one magnetism generating unit(311~317) generates a magnetic force.
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申请公布号 |
KR20100124967(A) |
申请公布日期 |
2010.11.30 |
申请号 |
KR20090043941 |
申请日期 |
2009.05.20 |
申请人 |
APSYS CO., LTD |
发明人 |
CHOI, KYUNG SOO;KO, CHAN KYU;CHA, WOO BYOUNG |
分类号 |
B01D53/32;A61L9/22 |
主分类号 |
B01D53/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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