发明名称 APPARATUS FOR GENERATING PLASMA
摘要 PURPOSE: An apparatus for generating plasma is provided to install another plasma generation gas injection path for the secondary supply of a plasma generation gas, thereby stably generating plasma. CONSTITUTION: A cathode electrode(110) is installed in the lower part of a cathode assembly(100). An anode electrode(210) surrounds the cathode electrode. An anode assembly(200) includes the anode electrode and plasma generation gas injection paths. If a high voltage is applied to the cathode electrode, plasma is generated between the anode electrode and the cathode electrode. The plasma generation gas injection paths inject a plasma generation gas to a plasma generation space. At least one magnetism generating unit(311~317) generates a magnetic force.
申请公布号 KR20100124967(A) 申请公布日期 2010.11.30
申请号 KR20090043941 申请日期 2009.05.20
申请人 APSYS CO., LTD 发明人 CHOI, KYUNG SOO;KO, CHAN KYU;CHA, WOO BYOUNG
分类号 B01D53/32;A61L9/22 主分类号 B01D53/32
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