发明名称 COMPOSITION FOR FORMING UNDERLAYER FILM FOR IMAGE FORMATION
摘要 <p>A composition for forming an underlayer film for image formation is provided which gives an image-forming underlayer film having high water repellency (hydrophobicity), capable of being easily changed in hydrophilicity/hydrophobicity by exposure even to a small amount of ultraviolet, and having a high relative permittivity. Also provided is a cured film obtained from the composition. The composition for forming an underlayer film for image formation is characterized by containing at least one member selected from the group consisting of a polyimide precursor comprising structural units represented by the following formulae (1) and (1a) and a polyimide obtained by the dehydrating cyclization of the polyimide precursor. (In the formulae, A represents a tetravalent organic group; B1 represents a divalent organic group having fluoroalkyl; B2 represents a divalent organic group; R1, R2, R1a, and R2a each independently represents hydrogen or a monovalent organic group; and n and m each is a positive integer, provided that 0.01=n/(n+m)=0.3.)</p>
申请公布号 KR20100125396(A) 申请公布日期 2010.11.30
申请号 KR20107022534 申请日期 2009.03.10
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 MAEDA SHINICHI;ONO GO
分类号 C08L79/08;C08G73/10;H01L21/28;H01L29/417 主分类号 C08L79/08
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