发明名称 Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system
摘要 A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.
申请公布号 US7843548(B2) 申请公布日期 2010.11.30
申请号 US20070907964 申请日期 2007.10.18
申请人 ASML NETHERLANDS B.V. 发明人 VAN DEN HEUVEL MARTINUS WILHELMUS;FRANKEN JOHANNES CHRISTIAAN LEONARDUS;VUGTS JOSEPHUS CORNELIS JOHANNES ANTONLUS
分类号 G03B27/52;G03B27/42 主分类号 G03B27/52
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