发明名称 |
Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system |
摘要 |
A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.
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申请公布号 |
US7843548(B2) |
申请公布日期 |
2010.11.30 |
申请号 |
US20070907964 |
申请日期 |
2007.10.18 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DEN HEUVEL MARTINUS WILHELMUS;FRANKEN JOHANNES CHRISTIAAN LEONARDUS;VUGTS JOSEPHUS CORNELIS JOHANNES ANTONLUS |
分类号 |
G03B27/52;G03B27/42 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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