发明名称 Nonvolatile memory devices including oxygen-deficient metal oxide layers and methods of manufacturing the same
摘要 A nonvolatile memory device includes at least one switching device and at least one storage node electrically connected to the at least one switching device. The at least one storage node includes a lower electrode, one or more oxygen-deficient metal oxide layers, one or more data storage layers, and an upper electrode. At least one of the one or more metal oxide layers is electrically connected to the lower electrode. At least one of the one or more data storage layers is electrically connected to at least one of the one or more metal oxide layers. The upper electrode is electrically connected to at least one of the one or more data storage layers. A method of manufacturing the nonvolatile memory device includes preparing the at least one switching device and forming the lower electrode, one or more metal oxide layers, one or more data storage layers, and upper electrode.
申请公布号 US7842991(B2) 申请公布日期 2010.11.30
申请号 US20070798703 申请日期 2007.05.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO SUNG-IL;CHO CHOONG-RAE;LEE EUN-HONG;YOO IN-KYEONG
分类号 H01L27/108 主分类号 H01L27/108
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