| 发明名称 |
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST |
| 摘要 |
<p>PURPOSE: A coating composition is provided to be useful as a planarization or via-fill composition for an overcoated photoresist, and to enable coating by spin-coating. CONSTITUTION: A coating composition for an overcoated photoresist comprises a resin containing a cyanurate group and a hydrophobic group. The coated substrate includes an anti-reflective composition layer formed with the coating composition, and a photoresist layer formed on the coating composition layer.</p> |
| 申请公布号 |
KR20100125199(A) |
申请公布日期 |
2010.11.30 |
| 申请号 |
KR20100047565 |
申请日期 |
2010.05.20 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
ZAMPINI ANTHONY;WAYTON GERALD B.;JAIN VIPUL;LIU CONG;COLEY SUZANNE;ONGAYI OWENDI |
| 分类号 |
G03F7/11;H01L21/027 |
主分类号 |
G03F7/11 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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