| 摘要 |
<p>A substrate holding apparatus holds a substrate that is exposed by exposure light that passes through a liquid. The substrate holding apparatus comprises: an opening; and a first holding part, which has a holding surface for holding the substrate inside the opening. At least part of an edge part that defines the opening has a first surface and a second surface, which is provided above and is nonparallel to the first surface. The second surface extends from a boundary part between the first surface and the second surface both upward and toward the outer side with respect to a center of the opening. The boundary part between the first surface and the second surface is substantially the same height as or higher than a front surface of the substrate, which is held by the first holding part.</p> |
