发明名称 APPARATUS OF SUPPLYING CHEMICAL LIQUID
摘要 PURPOSE: A chemical supplying apparatus is provided to form uniform supply pressure by preventing a pressure loss due to bubbles. CONSTITUTION: A supply line(110) flows the chemical for processing a substrate. At least one supply tank is connected to a supply line and stores the chemical. A bubble removing unit(130) is installed on a supply line. The bubble removing unit is installed on the supply line and removes the bubble inside the chemical.
申请公布号 KR20100124448(A) 申请公布日期 2010.11.29
申请号 KR20090043454 申请日期 2009.05.19
申请人 SEMES CO., LTD. 发明人 YU, JAE HYEOK;OH, RAE TAEK
分类号 H01L21/306 主分类号 H01L21/306
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