METHOD OF PRODUCING METAL SILICIDES

摘要

FIELD: electrical engineering. ^ SUBSTANCE: proposed method comprises deposition of metal on silicon and metal fusion performed by compression plasma flow with duration of 50-200 mcs and power density of 8-20 J/cm2 in variable magnetic field acting perpendicular to deposited metal plane, and with frequency of 1300-2000 Hz or 2100 Hz and induction of 0.22-12 mT or 12.5 mT. ^ EFFECT: reduced specific surface resistance and relative scatter of metal silicide surface resistance, simplified procedure. ^ 4 dwg, 2 tbl