| 摘要 |
PURPOSE: A film depositing apparatus is provided to suppress the deviation between film depositing processes with respect to substrates by uniformly dispersing heat on the substrates. CONSTITUTION: A gas supplying unit supplies a processing gas, including a raw-material gas, to a substrate. A supporting unit supports the lower side of a loading unit. A heating unit is installed on the loading unit. A temperature detecting unit detects the temperature of the substrate. The bottom side of a processing container(20) is connected with one end of an exhaust pipe(29). Based on the temperature detected by the temperature detecting unit, a controlling unit controls the amount of heat generated by the heating unit.
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