METHOD FOR FLEXIBLE ITO TREATING SUBSTRATES

摘要

PURPOSE: A flexible ITO substrate processing method is provided to improve the property of a flexible display device by effectively removing the moisture and impurities included in an ITO substrate within a short time. CONSTITUTION: A flexible substrate(10) is plasma-cured in the oxygen atmosphere. The oxygen gas used for the oxygen atmosphere is a one among O2, O3, and N2O. An ITO layer is formed by depositing it using the high frequency in 1KW~10KW, oxygen, and argon gas on the upper ITO target of the flexible substrate. The pressure of a furnace is 0.1torr~3torr. The heating temperature is 25°C~100°C.