发明名称 PLASMA PROCESSING APPARATUS
摘要 A plasma apparatus includes: a chamber which can be evacuated into vacuum; first electrode disposed within the chamber; a magnet mechanism having a magnet provided apart from and above the first electrode; a second electrode provided facing the first electrode; and a magnetic shield member provided in at least one of gaps between the first electrode and the magnet mechanism and between the first electrode and the second electrode.
申请公布号 US2010294656(A1) 申请公布日期 2010.11.25
申请号 US20100814979 申请日期 2010.06.14
申请人 CANON ANELVA CORPORATION 发明人 IKEDA MASAYOSHI;TANAKA YO;HIROISHI TSUTOMU
分类号 C23C14/34 主分类号 C23C14/34
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