发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having good sensitivity and the like. <P>SOLUTION: The radiation-sensitive resin composition includes an acid dissociable group-containing resin, a radiation-sensitive acid generator expressed by general formula of M<SP>+</SP>Z<SP>-</SP>(where M<SP>+</SP>represents an onium cation and Z<SP>-</SP>represents an anion expressed by general formula (1-1) or (1-2)), and a compound expressed by general formula (c1). In the formulae, R<SP>1</SP>to R<SP>5</SP>each represents an alkyl group having 1 to 20 carbon atoms with substitution of a fluorine atom, or the like; A represents a single bond or the like; and R<SP>6</SP>and R<SP>7</SP>each represents a hydrocarbon group having 1 to 25 carbon atoms, or the like. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010266755(A) 申请公布日期 2010.11.25
申请号 JP20090118966 申请日期 2009.05.15
申请人 JSR CORP 发明人 MARUYAMA KEN
分类号 G03F7/004;C08F212/06;C08F220/12;C08F220/58;G03F7/039;H01L21/027 主分类号 G03F7/004
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