| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of suppressing occurrence of exposure failure. <P>SOLUTION: The aligner exposes a substrate to exposure light via a first liquid. The aligner includes: a first liquid immersion mechanism that includes a liquid immersion member having a first surface and can form a first liquid immersion space by holding a first liquid between at least one portion of the first surface and an object surface so that an optical path of exposure light is filled with the first liquid; a second liquid immersion mechanism that includes a movable member having a second surface capable of opposing at least one portion of the first surface and can form a second liquid immersion space at least at one portion on the second surface by a second liquid; and a control unit for controlling the second liquid immersion mechanism so that the second liquid immersion space is formed between at least one portion of the first surface and at least one portion of the second surface when not exposing the substrate to light. <P>COPYRIGHT: (C)2011,JPO&INPIT |
