发明名称 CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve throughput by starting at an early stage the shuttle movement of a movable stage, after drawing moving of the movable stage. SOLUTION: A charged beam particle drawing apparatus 10 draws a pattern by a charged particle beam 10a1b in a stripe on a sample M laid on a movable stage 10a2a, during the drawing moving of the movable stage 10a2a, in which the movable stage 10a2a is made to move toward the longitudinal direction of the stripe, wherein the drawing moving of the movable stage 10a2a is stopped, based on a stripe end signal of the n-th stripe notified, when stripe end data attached to shot data of the charged particle beam 10a1b irradiated at the last in the n-th stripe is detected; shuttle movement of the movable stage 10a2a is executed, in such a way that the movable stage 10a2a is made to move at least in the short-hand direction of the stripe, based on the shuttle movement request stored in a shuttle movement request storage part 10b1f1. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010267844(A) 申请公布日期 2010.11.25
申请号 JP20090118506 申请日期 2009.05.15
申请人 NUFLARE TECHNOLOGY INC 发明人 TSURUMAKI HIDEYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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