| 摘要 |
PROBLEM TO BE SOLVED: To provide a continuous film deposition system which can utilize various film deposition methods. SOLUTION: In the continuous film deposition system where the surface of a base material S conveyed in a vacuum is supplied with film deposition particles so as to deposit a film, which comprises: a vacuum chamber 1; a film deposition roll 4 supported freely rotatably inside the vacuum chamber 1, around which the base material S is wound so as to convey the base material S; an unwinding roll 5 supplying the base material S to a film deposition region and a winding roll 6 winding the base material after the film deposition; and sputtering evaporation sources 71, 72 and 73 arranged so as to be confronted with the film deposition roll 4. Further, at the lower part of the film deposition roll 4, a pair of rotary cylindrical electrodes 11, 12 are provided in parallel with the film deposition roll 4, respectively. At least either of the pair of the rotary cylindrical electrodes is provided with a cylindrical target 13. COPYRIGHT: (C)2011,JPO&INPIT
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