| 摘要 |
A silicon-on-insulator (SOI) device with a strained silicon film has a substrate, and a buried oxide layer on the substrate. Silicon islands are formed on the buried oxide layer, the silicon islands being separated from each other by gaps. The buried oxide layers has recesses directly under the gaps. A material fills the recesses and the gaps, this material being different from the material forming the buried oxide layer. The material induces a net amount of strain in the silicon islands, thereby modifying the electrical properties of carriers in the silicon film and improving device performance. |
