METHOD FOR FORMING IMAGE THROUGH REACTION DEVELOPMENT

摘要

PROBLEM TO BE SOLVED: To improve heat resistance of a photoresist formed by the conventional method of forming a negative image through reaction development, and to secure an appropriate developing time.

SOLUTION: A negative photoresist is obtained through steps of: providing a photoresist layer containing a polycarbonate resin having a specified structure and a photoacid generator such as diazonaphthoquinone on a substrate; masking the layer with a desired pattern; irradiating the pattern surface with UV rays; and then developing the resist by using a developing solution comprising a tetra-substituted ammonium hydroxide, a low molecular weight alcohol, and a solvent containing water.

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