发明名称 STRUCTURE FOR SYMMETRICAL CAPACITOR
摘要 Capacitance circuits are provided disposing a lower vertical-native capacitor metal layer above a planar front-end-of-line semiconductor base substrate, planar metal bottom plates spaced a bottom plate distance from the base and top plates above the bottom plates spaced a top plate distance from the base defining metal-insulator-metal capacitors, top plate footprints disposed above the base substrate smaller than bottom plate footprints and exposing bottom plate remainder upper lateral connector surfaces; disposing parallel positive port and negative port upper vertical-native capacitor metal layers over and each connected to top plate and bottom plate upper remainder lateral connector surface. Moreover, electrical connecting of the first top plate and the second bottom plate to the positive port metal layer and of the second top plate and the first bottom to the negative port metal layer impart equal total negative port and positive port metal-insulator-metal capacitor extrinsic capacitance.
申请公布号 US2010295156(A1) 申请公布日期 2010.11.25
申请号 US20100851814 申请日期 2010.08.06
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHO CHOONGYEUN;KIM JONGHAE;KIM MOON J.;PLOUCHART JEAN-OLIVIER;TRZCINSKI ROBERT E.
分类号 H01L29/92 主分类号 H01L29/92
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