| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus with which a workpiece can be placed at an accurate position on a support member and the workpiece is supported on the support member in a correct attitude, and to provide a placing method for a tray in the plasma processing apparatus. SOLUTION: The plasma processing apparatus includes a projection 52 provided while protruding downward from the lower surface side of the tray 6, and a projection fitting-in hole 53 provided to be recessed downward on a tray mounting surface 5. In a process of placing the tray 6 on the tray placing surface 5 with an elevation pin 7, the projection 52 provided to the lower surface side of the tray 6 is fitted in the projection fitting-in hole 53 from above. COPYRIGHT: (C)2011,JPO&INPIT |
