| 摘要 |
An apparatus for embossing a web substrate is disclosed. The apparatus has first, second, and third pattern rolls. The first, second, and third patterns rolls each have respective first, second, and third pluralities of raised elements and recesses disposed thereon. A first nip is formed between the first and second pattern rolls and a third nip is formed between the first and third pattern rolls. The raised elements and the recesses of the first pattern roll are matingly engagable with the corresponding plurality of raised elements and recesses of the corresponding second and third pattern rolls. The first and second nips are both adapted to receive the web substrate and emboss the web substrate with the respective and corresponding embossing patterns when the web substrate is disposed within the respective nip.
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